Vanadium-Nickel Sputtering Target from China
A fabricated vanadium-nickel alloy disk used as a sputtering target for thin-film deposition in semiconductor and electronics manufacturing. HTS 8112.99.2000 covers such 'articles' of vanadium alloys where vanadium content is under 99% but dominant. Excludes pure metal targets.
Duty Rate — China → United States
37%
Rate breakdown
9903.03.0110%Except for products described in headings 9903.03.02–9903.03.11, articles the product of any country, as provided for in subdivision (aa) of U.S. note 2 to this subchapter
9903.88.0325%Except as provided in headings 9903.88.13, 9903.88.18, 9903.88.33, 9903.88.34, 9903.88.35, 9903.88.36, 9903.88.37, 9903.88.38, 9903.88.40, 9903.88.41, 9903.88.43, 9903.88.45, 9903.88.46, 9903.88.48, 9903.88.56, 9903.88.64, 9903.88.66, 9903.88.67, 9903.88.68, or 9903.88.69, articles the product of China, as provided for in U.S. note 20(e) to this subchapter and as provided for in the subheadings enumerated in U.S. note 20(f)
Import Tips
• Submit CAD drawings or specs confirming fabricated article status vs raw alloy
• Ensure REACH/SVHC declarations if destined for EU; TSCA for US