Vanadium-Nickel Sputtering Target from Mexico
A fabricated vanadium-nickel alloy disk used as a sputtering target for thin-film deposition in semiconductor and electronics manufacturing. HTS 8112.99.2000 covers such 'articles' of vanadium alloys where vanadium content is under 99% but dominant. Excludes pure metal targets.
Duty Rate — Mexico → United States
2%
Rate breakdown
9903.05.860%Universal product exemption (U.S. note 52(b))
Import Tips
• Submit CAD drawings or specs confirming fabricated article status vs raw alloy
• Ensure REACH/SVHC declarations if destined for EU; TSCA for US