Vanadium-Nickel Sputtering Target from Germany
A fabricated vanadium-nickel alloy disk used as a sputtering target for thin-film deposition in semiconductor and electronics manufacturing. HTS 8112.99.2000 covers such 'articles' of vanadium alloys where vanadium content is under 99% but dominant. Excludes pure metal targets.
Duty Rate — Germany → United States
12%
Rate breakdown
9903.03.0110%Except for products described in headings 9903.03.02–9903.03.11, articles the product of any country, as provided for in subdivision (aa) of U.S. note 2 to this subchapter
Import Tips
• Submit CAD drawings or specs confirming fabricated article status vs raw alloy
• Ensure REACH/SVHC declarations if destined for EU; TSCA for US