Thallium Sputtering Targets

Disk-shaped thallium targets for physical vapor deposition in coating semiconductor wafers. As fabricated articles of thallium, correctly under HTS 8112.59.00.00 'other'.

Import Duty Rates by Country of Origin

Origin CountryMFN RateCh.99 SurchargesTotal Effective Rate
🇨🇳China4%+25.0%29%
🇲🇽Mexico4%—4%
🇨🇦Canada4%—4%
🇩🇪Germany4%—4%
🇯🇵Japan4%—4%

Alternative Classifications

This product could be classified differently depending on its characteristics or intended use.

8112Same rate: 29%

If unmachined disk form

Unwrought thallium shapes like basic disks under 8112.11.

8479.89Lower: 12.5% vs 29%

If part of deposition machine

Parts for semiconductor machinery classify in Chapter 84/85.

3818.00.00Higher: 50% vs 29%

If chemical vapor deposition material

CVD precursors shift to Chapter 38 chemical products.

Not sure which classification is right?

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Import Tips & Compliance

• Specify vacuum deposition end-use to align with chapter notes on fittings

• Test for <99% thallium purity threshold per alloy definitions