8112.59.00.00/Thallium Sputtering Targets/China

Thallium Sputtering Targets from China

Disk-shaped thallium targets for physical vapor deposition in coating semiconductor wafers. As fabricated articles of thallium, correctly under HTS 8112.59.00.00 'other'.

Duty Rate — China → United States

29%

Rate breakdown

9903.88.0325%Except as provided in headings 9903.88.13, 9903.88.18, 9903.88.33, 9903.88.34, 9903.88.35, 9903.88.36, 9903.88.37, 9903.88.38, 9903.88.40, 9903.88.41, 9903.88.43, 9903.88.45, 9903.88.46, 9903.88.48, 9903.88.56, 9903.88.64, 9903.88.66, 9903.88.67, 9903.88.68, or 9903.88.69, articles the product of China, as provided for in U.S. note 20(e) to this subchapter and as provided for in the subheadings enumerated in U.S. note 20(f)
9903.03.030%Articles the product of any country, as provided for in subdivision (aa)(ii) of U.S. note 2 to this subchapter
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Import Tips

• Specify vacuum deposition end-use to align with chapter notes on fittings

• Test for <99% thallium purity threshold per alloy definitions

Thallium Sputtering Targets from China — Import Duty Rate | HTS 8112.59.00.00