8112.59.00.00/Thallium Sputtering Targets/Mexico

Thallium Sputtering Targets from Mexico

Disk-shaped thallium targets for physical vapor deposition in coating semiconductor wafers. As fabricated articles of thallium, correctly under HTS 8112.59.00.00 'other'.

Duty Rate — Mexico → United States

4%

Rate breakdown

9903.03.030%Articles the product of any country, as provided for in subdivision (aa)(ii) of U.S. note 2 to this subchapter
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Import Tips

• Specify vacuum deposition end-use to align with chapter notes on fittings

• Test for <99% thallium purity threshold per alloy definitions

Thallium Sputtering Targets from Mexico — Import Duty Rate | HTS 8112.59.00.00