Thallium Sputtering Targets from Mexico
Disk-shaped thallium targets for physical vapor deposition in coating semiconductor wafers. As fabricated articles of thallium, correctly under HTS 8112.59.00.00 'other'.
Duty Rate — Mexico → United States
4%
Rate breakdown
9903.05.860%Articles provided for in subdivision (b) of U.S. note 52 to this subchapter
Import Tips
• Specify vacuum deposition end-use to align with chapter notes on fittings
• Test for <99% thallium purity threshold per alloy definitions