Tantalum Powder 99.995% 5N Pure
5N ultra-high purity tantalum powder (99.995% Ta) for superconducting wire production. Classifies as unwrought powder under HTS 8103.20.00.90, essential for vacuum arc remelting. Lowest impurity levels for critical applications.
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Alternative Classifications
This product could be classified differently depending on its characteristics or intended use.
If copper-clad wire form
Tantalum used in Cu-stabilized superconductors shifts to copper chapter.
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Import Tips & Compliance
• Require GDMS analysis certificate showing <10ppb impurities
• Class 100 cleanroom packing mandatory for entry
• Traceability from mine to powder via chain-of-custody docs
Related Products under HTS 8103.20.00.90
Tantalum Powder 99.9% Pure
High-purity tantalum powder (99.9% Ta) used in electronics and additive manufacturing, supplied in unwrought form as fine particles less than 100 microns. It falls under HTS 8103.20.00.90 as unwrought tantalum powder, distinct from sintered powders or wrought forms. This classification covers tantalum powders not further processed into bars or rods.
Tantalum Metal Powder for Sputtering Targets
Ultra-fine tantalum powder (particle size 1-10 microns) designed for plasma spraying and sputtering target production in semiconductor manufacturing. Classified under HTS 8103.20.00.90 as unwrought tantalum powder, not sintered or wrought into articles. It remains in raw powder form suitable for further processing.
High-Purity Tantalum Granules
Tantalum granules (1-5mm irregular shapes) produced by gas atomization, used in capacitor manufacturing and powder metallurgy. This unwrought form fits HTS 8103.20.00.90 as 'other' tantalum powders and granules, excluding sintered rods. Granules are considered powder equivalents in unwrought state.
Tantalum Powder Tantalum-10W
Tantalum powder alloyed with 10% tungsten (Ta-90%, W-10%), used in high-temperature applications like aerospace components. Still classified under HTS 8103.20.00.90 as unwrought tantalum where Ta exceeds other elements per Chapter 81 alloy notes. Meets 'other' unwrought powder criteria.
Atomized Tantalum Powder -325 Mesh
Gas-atomized tantalum powder passing 325 mesh sieve (<44 microns), for thermal spraying and MIM (metal injection molding). HTS 8103.20.00.90 covers this unwrought powder form, not further sintered or shaped. Spherical morphology confirms raw production state.
Tantalum Flake Powder for Electronics
Flake-shaped tantalum powder (10-50 microns) optimized for electrolytic capacitor anodes. Falls under HTS 8103.20.00.90 as unwrought tantalum powder, valued for high surface area in electronics. Not sintered or wrought into components.