CVD Oxidation Furnace Quartz Liner Tube
Fused silica liner tube for chemical vapor deposition oxidation furnaces used in semiconductor manufacturing. Protects furnace chamber while providing clean processing environment for wafer oxidation. HTS 7017.10.30.00 due to fused quartz material and dedicated semiconductor furnace design.
Import Duty Rates by Country of Origin
Alternative Classifications
This product could be classified differently depending on its characteristics or intended use.
If in form of continuous fused quartz cullet before tube forming
Unworked glass in blocks or sheets classifies under heading 7001.
If made from borosilicate laboratory glass instead of fused quartz
Other laboratory glass materials have dedicated subheadings.
If designed as specialized parts for physical/chemical analysis instruments
Lab instrument parts may classify under Chapter 90 based on instrumental use.
Not sure which classification is right?
The Tariff Assistant works through the GRI rules on your specific product to reach the right HTS code — and can price the duty on it in the same conversation.
Import Tips & Compliance
• Specify inner diameter tolerance and length matching standard furnace specs in import docs
• Obtain material analysis confirming >99.99% SiO2 content as fused quartz
• Prevent reclassification by excluding any absorbent/reflecting coatings per Chapter notes
Related Products under HTS 7017.10.30.00
Silica Quartz Oxidation Boat Holder
A fused silica holder for wafer boats inserted into oxidation furnaces to grow oxide layers on semiconductor wafers. Engineered for thermal stability and minimal contamination in high-temperature environments. Falls under HTS 7017.10.30.00 due to its fused quartz construction and specific semiconductor furnace application.
Fused Quartz Diffusion Reactor Tube
A high-purity fused quartz tube designed for insertion into diffusion furnaces used in semiconductor wafer production. It withstands extreme temperatures and chemical exposure during doping processes. Classified under HTS 7017.10.30.00 as laboratory glassware of fused quartz specifically for semiconductor manufacturing furnaces.
High-Purity Fused Quartz LPCVD Reactor Tube
Precision fused quartz tube for low-pressure chemical vapor deposition (LPCVD) furnaces in semiconductor wafer processing. Features ultra-smooth interior to prevent particle contamination during thin film deposition. HTS 7017.10.30.00 applies as specialized fused silica glassware for diffusion/oxidation-type furnaces.
Semiconductor Furnace Quartz Wafer Boat Holder
Fused quartz holder designed to support multiple silicon wafer boats within diffusion and oxidation furnaces. Constructed to maintain precise alignment and thermal uniformity during semiconductor processing. Classified in HTS 7017.10.30.00 for its specific role in semiconductor wafer production furnaces.