Fused Quartz Diffusion Reactor Tube
A high-purity fused quartz tube designed for insertion into diffusion furnaces used in semiconductor wafer production. It withstands extreme temperatures and chemical exposure during doping processes. Classified under HTS 7017.10.30.00 as laboratory glassware of fused quartz specifically for semiconductor manufacturing furnaces.
Import Duty Rates by Country of Origin
Alternative Classifications
This product could be classified differently depending on its characteristics or intended use.
If made principally of sintered quartz ceramics rather than fused silica glass
Sintered ceramic refractory products for furnaces fall under Chapter 69, distinguished by manufacturing process from fused glass.
If not specifically designed for diffusion or oxidation furnaces in semiconductor production
Other fused quartz lab glassware without dedicated semiconductor furnace design goes to the residual subheading.
If imported as complete semiconductor processing equipment parts rather than standalone lab glassware
Machines and apparatus parts for semiconductor manufacture may classify under Chapter 84 based on assembly level.
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The Tariff Assistant works through the GRI rules on your specific product to reach the right HTS code — and can price the duty on it in the same conversation.
Import Tips & Compliance
• Verify material purity certification to confirm fused quartz composition meets HTS requirements, avoiding reclassification as general glassware
• Include technical specifications and end-use documentation proving semiconductor furnace application during customs entry
Related Products under HTS 7017.10.30.00
Silica Quartz Oxidation Boat Holder
A fused silica holder for wafer boats inserted into oxidation furnaces to grow oxide layers on semiconductor wafers. Engineered for thermal stability and minimal contamination in high-temperature environments. Falls under HTS 7017.10.30.00 due to its fused quartz construction and specific semiconductor furnace application.
CVD Oxidation Furnace Quartz Liner Tube
Fused silica liner tube for chemical vapor deposition oxidation furnaces used in semiconductor manufacturing. Protects furnace chamber while providing clean processing environment for wafer oxidation. HTS 7017.10.30.00 due to fused quartz material and dedicated semiconductor furnace design.
High-Purity Fused Quartz LPCVD Reactor Tube
Precision fused quartz tube for low-pressure chemical vapor deposition (LPCVD) furnaces in semiconductor wafer processing. Features ultra-smooth interior to prevent particle contamination during thin film deposition. HTS 7017.10.30.00 applies as specialized fused silica glassware for diffusion/oxidation-type furnaces.
Semiconductor Furnace Quartz Wafer Boat Holder
Fused quartz holder designed to support multiple silicon wafer boats within diffusion and oxidation furnaces. Constructed to maintain precise alignment and thermal uniformity during semiconductor processing. Classified in HTS 7017.10.30.00 for its specific role in semiconductor wafer production furnaces.