Quartz reactor tubes and holders designed for insertion into diffusion and oxidation furnaces for production of semiconductor wafers
Laboratory, hygienic or pharmaceutical glassware, whether or not graduated or calibrated: > Of fused quartz or other fused silica: > Quartz reactor tubes and holders designed for insertion into diffusion and oxidation furnaces for production of semiconductor wafers
Duty Rate (from China)
Except for products described in headings 9903.03.02–9903.03.11, articles the product of any country, as provided for in subdivision (aa) of U.S. note 2 to this subchapter
Except as provided in headings 9903.88.13, 9903.88.18, 9903.88.33, 9903.88.34, 9903.88.35, 9903.88.36, 9903.88.37, 9903.88.38, 9903.88.40, 9903.88.41, 9903.88.43, 9903.88.45, 9903.88.46, 9903.88.48, 9903.88.56, 9903.88.64, 9903.88.66, 9903.88.67, 9903.88.68, or 9903.88.69, articles the product of China, as provided for in U.S. note 20(e) to this subchapter and as provided for in the subheadings enumerated in U.S. note 20(f)
Products classified under HTS 7017.10.30.00
Silica Quartz Oxidation Boat Holder
A fused silica holder for wafer boats inserted into oxidation furnaces to grow oxide layers on semiconductor wafers. Engineered for thermal stability and minimal contamination in high-temperature environments. Falls under HTS 7017.10.30.00 due to its fused quartz construction and specific semiconductor furnace application.
CVD Oxidation Furnace Quartz Liner Tube
Fused silica liner tube for chemical vapor deposition oxidation furnaces used in semiconductor manufacturing. Protects furnace chamber while providing clean processing environment for wafer oxidation. HTS 7017.10.30.00 due to fused quartz material and dedicated semiconductor furnace design.
Fused Quartz Diffusion Reactor Tube
A high-purity fused quartz tube designed for insertion into diffusion furnaces used in semiconductor wafer production. It withstands extreme temperatures and chemical exposure during doping processes. Classified under HTS 7017.10.30.00 as laboratory glassware of fused quartz specifically for semiconductor manufacturing furnaces.
High-Purity Fused Quartz LPCVD Reactor Tube
Precision fused quartz tube for low-pressure chemical vapor deposition (LPCVD) furnaces in semiconductor wafer processing. Features ultra-smooth interior to prevent particle contamination during thin film deposition. HTS 7017.10.30.00 applies as specialized fused silica glassware for diffusion/oxidation-type furnaces.
Semiconductor Furnace Quartz Wafer Boat Holder
Fused quartz holder designed to support multiple silicon wafer boats within diffusion and oxidation furnaces. Constructed to maintain precise alignment and thermal uniformity during semiconductor processing. Classified in HTS 7017.10.30.00 for its specific role in semiconductor wafer production furnaces.