CVD Oxidation Furnace Quartz Liner Tube from China
Fused silica liner tube for chemical vapor deposition oxidation furnaces used in semiconductor manufacturing. Protects furnace chamber while providing clean processing environment for wafer oxidation. HTS 7017.10.30.00 due to fused quartz material and dedicated semiconductor furnace design.
Duty Rate — China → United States
37.5%
Rate breakdown
9903.05.3112.5%Except for products described in headings 9903.05.85–9903.05.92, articles the product of China, as provided for in U.S. note 52 to this subchapter
9903.88.0325%Except as provided in headings 9903.88.13, 9903.88.18, 9903.88.33, 9903.88.34, 9903.88.35, 9903.88.36, 9903.88.37, 9903.88.38, 9903.88.40, 9903.88.41, 9903.88.43, 9903.88.45, 9903.88.46, 9903.88.48, 9903.88.56, 9903.88.64, 9903.88.66, 9903.88.67, 9903.88.68, or 9903.88.69, articles the product of China, as provided for in U.S. note 20(e) to this subchapter and as provided for in the subheadings enumerated in U.S. note 20(f)
Import Tips
• Specify inner diameter tolerance and length matching standard furnace specs in import docs
• Obtain material analysis confirming >99.99% SiO2 content as fused quartz
• Prevent reclassification by excluding any absorbent/reflecting coatings per Chapter notes