PFC-116 Chemical Vapor Deposition Precursor
Perfluorohexane (PFC-116) mixture used as precursor gas in chemical vapor deposition for optical coatings. HTS 3827.59.00.00 due to PFC content, CFC/HCFC-free. Critical for thin-film deposition in photonics industry.
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Alternative Classifications
This product could be classified differently depending on its characteristics or intended use.
If other CVD precursors
Non-halocarbon deposition precursors classify as other preparations
If other industrial phosphides/phosphines
Phosphorus-containing precursors use different classification
If pure perfluorohexane
Single PFC compounds classify under Chapter 29 fluorocarbons
Not sure which classification is right?
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Import Tips & Compliance
• Include CVD process validation data; DOT special permit for high-pressure PFC cylinders; TSCA PMN if new precursor formulation
Related Products under HTS 3827.59.00.00
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