PFC-116 Chemical Vapor Deposition Precursor from Canada
Perfluorohexane (PFC-116) mixture used as precursor gas in chemical vapor deposition for optical coatings. HTS 3827.59.00.00 due to PFC content, CFC/HCFC-free. Critical for thin-film deposition in photonics industry.
Duty Rate — Canada → United States
13.7%
Rate breakdown
9903.03.0110%Except for products described in headings 9903.03.02–9903.03.11, articles the product of any country, as provided for in subdivision (aa) of U.S. note 2 to this subchapter
Import Tips
• Include CVD process validation data; DOT special permit for high-pressure PFC cylinders; TSCA PMN if new precursor formulation