PFC-116 Chemical Vapor Deposition Precursor from Japan
Perfluorohexane (PFC-116) mixture used as precursor gas in chemical vapor deposition for optical coatings. HTS 3827.59.00.00 due to PFC content, CFC/HCFC-free. Critical for thin-film deposition in photonics industry.
Duty Rate — Japan → United States
12.5%
Rate breakdown
9903.05.4912.5%Section 301 (forced labor) — Japan (col1 rate < 12.5 percent): MFN < 12.5% → total duty capped at 12.5%
Import Tips
• Include CVD process validation data; DOT special permit for high-pressure PFC cylinders; TSCA PMN if new precursor formulation