PFC-116 Chemical Vapor Deposition Precursor from Japan
Perfluorohexane (PFC-116) mixture used as precursor gas in chemical vapor deposition for optical coatings. HTS 3827.59.00.00 due to PFC content, CFC/HCFC-free. Critical for thin-film deposition in photonics industry.
Duty Rate — Japan → United States
12.5%
Rate breakdown
9903.05.4912.5%Except for products described in headings 9903.05.85–9903.05.92, articles the product of Japan, with an ad valorem (or ad valorem equivalent) rate of duty under column 1 less than 12.5 percent, as provided for in U.S. note 52 to this subchapter
Import Tips
• Include CVD process validation data; DOT special permit for high-pressure PFC cylinders; TSCA PMN if new precursor formulation