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3827.59.00.00/PFC-116 Chemical Vapor Deposition Precursor/Mexico

PFC-116 Chemical Vapor Deposition Precursor from Mexico

Perfluorohexane (PFC-116) mixture used as precursor gas in chemical vapor deposition for optical coatings. HTS 3827.59.00.00 due to PFC content, CFC/HCFC-free. Critical for thin-film deposition in photonics industry.

Duty Rate — Mexico → United States

13.7%

Rate breakdown

9903.05.5510%Section 301 (forced labor) — additional 10% ad valorem on products of Mexico
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Import Tips

• Include CVD process validation data; DOT special permit for high-pressure PFC cylinders; TSCA PMN if new precursor formulation