Niobium Oxide Sputtering Target Material

Nb2O5 in sintered target form for thin-film deposition in semiconductors, still classified as chemically defined niobium oxide. Under HTS 2825.90.1500 despite shaped form, as not fully worked. Used in optical coatings.

Import Duty Rates by Country of Origin

Origin CountryMFN RateCh.99 SurchargesTotal Effective Rate
πŸ‡¨πŸ‡³China3.7%+25.0%28.7%
πŸ‡²πŸ‡½Mexico3.7%β€”3.7%
πŸ‡¨πŸ‡¦Canada3.7%β€”3.7%
πŸ‡©πŸ‡ͺGermany3.7%β€”3.7%
πŸ‡―πŸ‡΅Japan3.7%β€”3.7%

Alternative Classifications

This product could be classified differently depending on its characteristics or intended use.

3818.00.00Higher: 50% vs 28.7%

If doped silicon/niobium for electronics in disc form

Doped chemical elements cut into wafers/discs excluded to 3818.

6909.11Lower: 14.5% vs 28.7%

If as ceramic articles of oxide

Porcelain or ceramic crucibles from niobium oxide go to Chapter 69.

2849.90.50.00Higher: 38.7% vs 28.7%

If as niobium carbide

Carbides of metals are in 2849, distinct from oxides.

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Import Tips & Compliance

β€’ Confirm if 'unworked' per Chapter note on doped elements; shaped targets may risk reclassification

β€’ Include technical data sheet specifying oxide purity for CBP review

β€’ Watch for exclusion if containing radioactive isotopes (heading 2844)