Niobium Oxide Sputtering Target Material from China
Nb2O5 in sintered target form for thin-film deposition in semiconductors, still classified as chemically defined niobium oxide. Under HTS 2825.90.1500 despite shaped form, as not fully worked. Used in optical coatings.
Duty Rate — China → United States
28.7%
Rate breakdown
9903.88.0325%Except as provided in headings 9903.88.13, 9903.88.18, 9903.88.33, 9903.88.34, 9903.88.35, 9903.88.36, 9903.88.37, 9903.88.38, 9903.88.40, 9903.88.41, 9903.88.43, 9903.88.45, 9903.88.46, 9903.88.48, 9903.88.56, 9903.88.64, 9903.88.66, 9903.88.67, 9903.88.68, or 9903.88.69, articles the product of China, as provided for in U.S. note 20(e) to this subchapter and as provided for in the subheadings enumerated in U.S. note 20(f)
9903.03.030%Articles the product of any country, as provided for in subdivision (aa)(ii) of U.S. note 2 to this subchapter
Import Tips
• Confirm if 'unworked' per Chapter note on doped elements; shaped targets may risk reclassification
• Include technical data sheet specifying oxide purity for CBP review
• Watch for exclusion if containing radioactive isotopes (heading 2844)