Niobium Oxide Sputtering Target Material from Japan
Nb2O5 in sintered target form for thin-film deposition in semiconductors, still classified as chemically defined niobium oxide. Under HTS 2825.90.1500 despite shaped form, as not fully worked. Used in optical coatings.
Duty Rate — Japan → United States
3.7%
Rate breakdown
9903.03.030%Articles the product of any country, as provided for in subdivision (aa)(ii) of U.S. note 2 to this subchapter
Import Tips
• Confirm if 'unworked' per Chapter note on doped elements; shaped targets may risk reclassification
• Include technical data sheet specifying oxide purity for CBP review
• Watch for exclusion if containing radioactive isotopes (heading 2844)