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2825.90.15.00/Niobium Oxide Sputtering Target Material/Japan

Niobium Oxide Sputtering Target Material from Japan

Nb2O5 in sintered target form for thin-film deposition in semiconductors, still classified as chemically defined niobium oxide. Under HTS 2825.90.1500 despite shaped form, as not fully worked. Used in optical coatings.

Duty Rate — Japan → United States

3.7%

Rate breakdown

9903.03.030%Articles the product of any country, as provided for in subdivision (aa)(ii) of U.S. note 2 to this subchapter
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Import Tips

• Confirm if 'unworked' per Chapter note on doped elements; shaped targets may risk reclassification

• Include technical data sheet specifying oxide purity for CBP review

• Watch for exclusion if containing radioactive isotopes (heading 2844)

Niobium Oxide Sputtering Target Material from Japan — Import Duty Rate | HTS 2825.90.15.00