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Wafer Edge Grinding Machine

Wafer edge grinding machines profile the edges of semiconductor wafers to prevent chipping and ensure safe handling during fabrication. This edge profiling is essential for maintaining wafer integrity throughout the manufacturing process. Edge grinding machines are used in semiconductor device manufacturing.

Import Duty Rates by Country of Origin

Origin CountryMFN TariffSurtaxesTotal Effective Rate
🇨🇳ChinaFree—Free
🇲🇽MexicoFree—Free
🇺🇸United StatesFree—Free
🇩🇪GermanyFree—Free
🇯🇵JapanFree—Free

Alternative Classifications

This product could be classified differently depending on its characteristics or intended use.

8486.10.00Same rate: Free

If the edge grinding machine is used for processing wafers before device fabrication

Machines for manufacturing semiconductor wafers are classified under 8486.10.00.

Not sure which classification is right?

The Tariff Assistant works through the GRI rules on your specific product to reach the right tariff item — and can price the duty on it in the same conversation.

Import Tips & Compliance

• Classify the edge grinding machine under 8486.20.00 if it is used for semiconductor wafer processing

• Provide evidence of its use in IC fabrication, such as edge profiling specifications

• Ensure compliance with Canadian safety standards for grinding machinery

Related Products under Tariff item 8486.20.00

Chemical Mechanical Wafer Polisher

Chemical mechanical polishing (CMP) tools polish semiconductor wafers to atomic-level flatness using a combination of chemical slurry and mechanical pads. This process is critical for planarizing layers during integrated circuit fabrication, ensuring subsequent lithography and etching steps are accurate. CMP tools are essential for semiconductor device manufacturing, falling under this tariff item.

Chemical Vapor Deposition Furnace

Chemical vapor deposition (CVD) furnaces deposit thin films of insulators, metals, or semiconductors onto wafers through gas-phase chemical reactions. These films are essential for creating the layers of integrated circuits, providing conformal coatings with precise thickness control. CVD furnaces are a core piece of equipment in semiconductor device manufacturing.

Crystal Boule Grinder

Crystal boule grinders shape semiconductor boules to precise diameters and grind flats that indicate conductivity type and resistivity. This preparation step is essential before slicing the boule into wafers for semiconductor device manufacturing. The grinder is a machine used solely or principally for the manufacture of semiconductor boules.

Czochralski Crystal Puller

A Czochralski crystal puller produces extremely pure monocrystalline silicon boules by pulling a seed crystal from molten silicon. These boules are the starting material for semiconductor wafers used in electronic integrated circuits. The puller is a machine used solely or principally for the manufacture of semiconductor boules.

Dielectric Film Sputtering System

Dielectric film sputtering systems use plasma sputtering to deposit thin dielectric and metal films onto semiconductor wafers. These films are crucial for creating insulating and conductive layers in integrated circuits. Sputtering systems are essential for semiconductor device manufacturing, providing pinhole-free films with precise thickness.

Float Zone Crystal Grower

Float zone crystal growers produce monocrystalline semiconductor boules using the float zone method, which is ideal for high-purity silicon wafers. This method is used for applications requiring extremely low impurity levels in electronic integrated circuits. The grower is a machine used solely or principally for the manufacture of semiconductor boules.