Silicon Wafer Cleaning Station
Automated cleaning stations remove particles and contaminants from semiconductor wafers using megasonic, brush, or chemical methods before processing. This cleaning is essential for maintaining the purity and quality of wafers during integrated circuit fabrication. Cleaning stations are used in semiconductor device manufacturing.
Import Duty Rates by Country of Origin
| Origin Country | MFN Tariff | Surtaxes | Total Effective Rate |
|---|---|---|---|
| 🇨🇳China | Free | — | Free |
| 🇲🇽Mexico | Free | — | Free |
| 🇺🇸United States | Free | — | Free |
| 🇩🇪Germany | Free | — | Free |
| 🇯🇵Japan | Free | — | Free |
More Specific Codes
This product may fall under a more specific subheading:
Alternative Classifications
This product could be classified differently depending on its characteristics or intended use.
If the cleaning station is used for cleaning wafers before device fabrication
Machines for manufacturing semiconductor wafers are classified under 8486.10.00.
Not sure which classification is right?
The Tariff Assistant works through the GRI rules on your specific product to reach the right tariff item — and can price the duty on it in the same conversation.
Import Tips & Compliance
• Classify the cleaning station under 8486.20.00 if it is used for semiconductor wafer processing
• Provide evidence of its use in IC fabrication, such as cleaning process specifications
• Verify if the station uses any chemicals that may require special import documentation
Related Products under Tariff item 8486.20.00
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Chemical mechanical polishing (CMP) tools polish semiconductor wafers to atomic-level flatness using a combination of chemical slurry and mechanical pads. This process is critical for planarizing layers during integrated circuit fabrication, ensuring subsequent lithography and etching steps are accurate. CMP tools are essential for semiconductor device manufacturing, falling under this tariff item.
Chemical Vapor Deposition Furnace
Chemical vapor deposition (CVD) furnaces deposit thin films of insulators, metals, or semiconductors onto wafers through gas-phase chemical reactions. These films are essential for creating the layers of integrated circuits, providing conformal coatings with precise thickness control. CVD furnaces are a core piece of equipment in semiconductor device manufacturing.
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Czochralski Crystal Puller
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Dielectric Film Sputtering System
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