Plasma Etching Reactor
Plasma etching reactors use reactive ion etching to anisotropically remove material from semiconductor wafers, defining circuit patterns with high precision. This process is essential for creating the intricate structures of integrated circuits. Plasma etching reactors are core semiconductor device processing apparatus.
Import Duty Rates by Country of Origin
| Origin Country | MFN Tariff | Surtaxes | Total Effective Rate |
|---|---|---|---|
| 🇨🇳China | Free | — | Free |
| 🇲🇽Mexico | Free | — | Free |
| 🇺🇸United States | Free | — | Free |
| 🇩🇪Germany | Free | — | Free |
| 🇯🇵Japan | Free | — | Free |
More Specific Codes
This product may fall under a more specific subheading:
Alternative Classifications
This product could be classified differently depending on its characteristics or intended use.
If the etching reactor is used for processing wafers before device fabrication
Machines for manufacturing semiconductor wafers are classified under 8486.10.00.
Not sure which classification is right?
The Tariff Assistant works through the GRI rules on your specific product to reach the right tariff item — and can price the duty on it in the same conversation.
Import Tips & Compliance
• Ensure the etching reactor is used for semiconductor wafer processing to qualify under 8486.20.00
• Provide technical data showing its use in IC fabrication
• Verify if the reactor uses any hazardous gases that may require special handling or import permits
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