Pfeiffer Vacuum Cluster Tool PVD from Mexico
Pfeiffer Vacuum cluster tool physical vapor deposition apparatus integrates multiple PVD process chambers with central handling for compound semiconductor manufacturing. Features cryopump technology for UHV conditions. HTS 8543.70.20.00 specifically for such apparatus.
Duty Rate — Mexico → United States
12.5%
Rate breakdown
9903.03.0110%Except for products described in headings 9903.03.02–9903.03.11, articles the product of any country, as provided for in subdivision (aa) of U.S. note 2 to this subchapter
Import Tips
• Document cryopump specifications and base pressure capabilities
• Compound semiconductor use may require ITAR/EAR classification
• Provide complete cluster configuration schematic