Pfeiffer Vacuum Cluster Tool PVD from Germany
Pfeiffer Vacuum cluster tool physical vapor deposition apparatus integrates multiple PVD process chambers with central handling for compound semiconductor manufacturing. Features cryopump technology for UHV conditions. HTS 8543.70.20.00 specifically for such apparatus.
Duty Rate — Germany → United States
10%
Rate breakdown
9903.05.3910%Section 301 (forced labor) — European Union member state (col1 rate < 10 percent): MFN < 10% → total duty capped at 10%
Import Tips
• Document cryopump specifications and base pressure capabilities
• Compound semiconductor use may require ITAR/EAR classification
• Provide complete cluster configuration schematic