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CMP Polisher Retaining Ring from Germany

Consumable retaining ring that contains polishing pad on CMP platen edge while allowing controlled pad wear during semiconductor wafer planarization. Engineered plastic composite part. 8487.90.00 classification.

Duty Rate — Germany → United States

10%

Rate breakdown

9903.05.3910%Section 301 (forced labor) — European Union member state (col1 rate < 10 percent): MFN < 10% → total duty capped at 10%

Import Tips

Document wear rate specifications and material composition for customs

Confirm ring design prevents pad edge tearing

Common misclassification as plastic article under Chapter 39

CMP Polisher Retaining Ring from Germany — Import Duty Rate | HTS 8487.90.00