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CMP Polisher Retaining Ring from Canada

Consumable retaining ring that contains polishing pad on CMP platen edge while allowing controlled pad wear during semiconductor wafer planarization. Engineered plastic composite part. 8487.90.00 classification.

Duty Rate — Canada → United States

13.9%

Rate breakdown

9903.05.2910%Section 301 (forced labor) — additional 10% ad valorem on products of Canada

Import Tips

Document wear rate specifications and material composition for customs

Confirm ring design prevents pad edge tearing

Common misclassification as plastic article under Chapter 39