Semiconductor Wafer Lapping Bearing Unit

Precision housed bearing for wafer lapping/polishing machines that achieve flatness for device fabrication. Under HTS 8483.20.80 as other housed bearings per statistical note (b)(ii)(C) for wafer preparation. Critical for sub-micron surface finish.

Import Duty Rates by Country of Origin

Origin CountryMFN RateCh.99 SurchargesTotal Effective Rate
🇨🇳China4.5%+35.0%39.5%
🇲🇽Mexico4.5%+10.0%14.5%
🇨🇦Canada4.5%+10.0%14.5%
🇩🇪Germany4.5%+10.0%14.5%
🇯🇵Japan4.5%+10.0%14.5%

More Specific Codes

This product may fall under a more specific subheading:

Alternative Classifications

This product could be classified differently depending on its characteristics or intended use.

8421.19.00.00Lower: 36.3% vs 39.5%

If for chemical-mechanical polishing equipment

CMP wafer polishers classified as chemical processing centrifuges.

8483.90.80Lower: 37.8% vs 39.5%

If lapping ring housing only

Separate housings without bearings are general parts.

9031.49.40Lower: 35% vs 39.5%

If lapping with profile measurement

Flatness testing integrated units become measuring instruments.

Not sure which classification is right?

Our AI classifier can analyze your specific product and recommend the correct HTS code with confidence.

Import Tips & Compliance

Include lapping pressure and slurry compatibility specs in technical docs

Class 1 cleanroom certification and particle generation data required

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