Deposition Chamber Vacuum Controller from Mexico
PCA monitoring turbopump speed and pressure in PVD/CVD chambers depositing thin films on semiconductor wafers. Under HTS 8473.30.1180 as printed circuit part principally for 8471 deposition machines, no CRT. Base pressure <10^-7 Torr.
Duty Rate — Mexico → United States
25%
Rate breakdown
9903.79.0125%Semiconductor articles as provided for in subdivisions (a) and (b) of U.S. note 39 to this subchapter
9903.03.030%Articles the product of any country, as provided for in subdivision (aa)(ii) of U.S. note 2 to this subchapter
Import Tips
• Ultimate pressure specs documented
• Throttling valve integration proof
• Helium leak rate certifications