Handheld Pneumatic Wafer Lapping Tool from Japan
Pneumatic hand tool for lapping semiconductor wafers to achieve precise flatness before fabrication. Falls under HTS 8467.19.50.90 as other pneumatic hand tools for wafer preparation in semiconductor processing. Ensures surface tolerances critical for device yield.
Duty Rate — Japan → United States
12.5%
Rate breakdown
9903.05.4912.5%Except for products described in headings 9903.05.85–9903.05.92, articles the product of Japan, with an ad valorem (or ad valorem equivalent) rate of duty under column 1 less than 12.5 percent, as provided for in U.S. note 52 to this subchapter
Import Tips
• Certify lapping plate materials (e.g
• cast iron or copper) and pressure specs for cleanroom semiconductor use
• Use invoices specifying 'for monocrystalline silicon/gallium arsenide wafers' to match statistical notes