Wafer Lapping Plate from Japan
Cast iron or ceramic lapping plate for double-sided wafer lappers that achieve total thickness variation (TTV) <1μm on silicon wafers (8465 preparation equipment). Features precise flatness and conditioning ring compatibility. 8466.92.50 part for heading 8465 machines.
Duty Rate — Japan → United States
14.7%
Rate breakdown
9903.03.0110%Except for products described in headings 9903.03.02–9903.03.11, articles the product of any country, as provided for in subdivision (aa) of U.S. note 2 to this subchapter
Import Tips
• Certify plate flatness specs (<0.5μm) and compatibility with specific lapping machines
• Document slurry compatibility and semiconductor-only end use