Float Zone Crystal Grower from Japan
Equipment employing the float zone method to produce high-purity silicon crystals by zone melting and shaping. It integrates sawing and grinding to slice and finish boules into wafer-ready forms, falling under HTS 8461.90.60 for other machine tools removing metal in semiconductor processing.
Duty Rate — Japan → United States
12.5%
Rate breakdown
9903.05.4912.5%Except for products described in headings 9903.05.85–9903.05.92, articles the product of Japan, with an ad valorem (or ad valorem equivalent) rate of duty under column 1 less than 12.5 percent, as provided for in U.S. note 52 to this subchapter
Import Tips
• Include process flow diagrams showing metal/cermet removal steps for accurate HTS verification
• Ensure labeling complies with semiconductor equipment standards to prevent delays