Float Zone Crystal Grower from Japan
Equipment employing the float zone method to produce high-purity silicon crystals by zone melting and shaping. It integrates sawing and grinding to slice and finish boules into wafer-ready forms, falling under HTS 8461.90.60 for other machine tools removing metal in semiconductor processing.
Duty Rate — Japan → United States
14.4%
Rate breakdown
9903.03.0110%Except for products described in headings 9903.03.02–9903.03.11, articles the product of any country, as provided for in subdivision (aa) of U.S. note 2 to this subchapter
Import Tips
• Include process flow diagrams showing metal/cermet removal steps for accurate HTS verification
• Ensure labeling complies with semiconductor equipment standards to prevent delays