Semiconductor Wafer Polisher Head Assembly from Japan
Complete polishing head with carrier film, retaining ring, and drive shaft for single/dual wafer polishers. Applies 2-7 psi pressure for planarization. Major replacement part for wafer polishers in 8442.40.00.00.
Duty Rate — Japan → United States
12.5%
Rate breakdown
9903.05.4912.5%Section 301 (forced labor) — Japan (col1 rate < 12.5 percent): MFN < 12.5% → total duty capped at 12.5%
Import Tips
• Document removal rate specs (0.5-2.0 μm/min) and compatible pad types
• Complete head vs consumable pieces (retainer ring only) affects duty treatment
• Edge bead removal capability must be specified for advanced wafer classification