Semiconductor Wafer Polishing Head from Germany
Carrier head assembly for chemical-mechanical polishing (CMP) platens preparing wafer surfaces for device fabrication, per statistical note wafer polishers. HTS 8431.49.90.94 as part for heading 8430 polishing machines in semiconductor processing.
Duty Rate — Germany → United States
10%
Rate breakdown
9903.03.0110%Except for products described in headings 9903.03.02–9903.03.11, articles the product of any country, as provided for in subdivision (aa) of U.S. note 2 to this subchapter
Import Tips
• Provide CMP process datasheets linking to statistical note polishers; declare pad pressure specs; common error: confusing with heading 8428 lifting gear heads