Crystal Puller RF Heating Coil

Radio frequency induction coil for melting silicon in float zone crystal pullers under 8425. Part in 8431.10.0090 provides zone-refined purity. Water-cooled copper construction for high-power operation.

Import Duty Rates by Country of Origin

Origin CountryMFN RateCh.99 SurchargesTotal Effective Rate
🇨🇳ChinaFree+50.0%50%
🇲🇽MexicoFree+25.0%25%
🇨🇦CanadaFree+25.0%25%
🇩🇪GermanyFree+15.0%15%
🇯🇵JapanFree+15.0%15%

Alternative Classifications

This product could be classified differently depending on its characteristics or intended use.

8504.50Lower: 10% vs 50%

If as general inductors or electrical transformers

Electrical apparatus without mechanical tie to 8425 classifies in Chapter 85.

8516.79.00.00Lower: 12.7% vs 50%

If standalone electric heaters

General heating resistors shift from machinery parts.

Not sure which classification is right?

Our AI classifier can analyze your specific product and recommend the correct HTS code with confidence.

Import Tips & Compliance

Document RF frequency (typically 450kHz) and power rating; include cooling channel specs

Pitfall: classification as transformer under 8504

Related Products under HTS 8431.10.00.90

Wafer Grinder Air Bearing Pad

Porous carbon pad providing frictionless support for wafer grinding spindles in 8425 equipment. 8431.10.0090 classification maintains <0.5 micron flatness. Critical for vibration-free surface preparation.

Diamond Wafer Slicing Saw Arbor

Precision shaft holding diamond blade in wafer slicing saws of heading 8425. 8431.10.0090 part ensures spindle runout <1 micron. Hardened steel with coolant channels for continuous operation.

CMP Polisher Platen Assembly

Rotating platen holding polishing pad in chemical mechanical planarization tools for wafers. Integral part of 8425 polishers under 8431.10.0090. Composite construction for uniform pressure distribution.

Semiconductor Wafer Lapper Conditioning Ring

Diamond pellet ring for dressing lapping plates in wafer prep equipment of 8425. 8431.10.0090 part maintains plate flatness during production. Prevents glazing for consistent removal rates.

Czochralski Crystal Puller Furnace

A high-temperature furnace used in the Czochralski method to grow monocrystalline silicon boules for semiconductor wafer production. It is a part of crystal grower and puller machinery classified under HTS 8425 as semiconductor manufacturing equipment. The 'Other' subheading 8431.10.0090 applies to specialized parts not elsewhere specified for heading 8425 machinery.

Float Zone Crystal Growth Chamber

A vacuum chamber component for float zone method crystal growers, producing high-purity silicon ingots for wafers. Classed as a part for 8425 semiconductor machinery under 8431.10.0090. Ensures precise control of zone melting process in semiconductor material growth.