Nanoparticle Slurry Disperser for STI CMP from Canada
High-pressure disperser projecting ceria nanoparticle slurry for shallow trench isolation chemical mechanical polishing. Classified HTS 8424.89.9000 for powder/liquid dispersion in semiconductor planarization.
Duty Rate — Canada → United States
11.8%
Rate breakdown
9903.03.0110%Except for products described in headings 9903.03.02–9903.03.11, articles the product of any country, as provided for in subdivision (aa) of U.S. note 2 to this subchapter
Import Tips
• Provide zeta potential and particle size distribution data for slurry
• Classify point-of-use mixing with storage tanks as complete system