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8419.89.95.40/RTP Rapid Thermal Processor Chiller/Japan

RTP Rapid Thermal Processor Chiller from Japan

High-capacity chiller for rapid thermal processing (RTP) systems, enabling millisecond temperature ramps up to 1200°C followed by controlled cooling for wafer annealing. 8419.89.9540 for semiconductor thermal treatment cooling equipment. Critical for dopant activation.

Duty Rate — Japan → United States

12.5%

Rate breakdown

9903.05.4912.5%Section 301 (forced labor) — Japan (col1 rate < 12.5 percent): MFN < 12.5% → total duty capped at 12.5%
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Import Tips

• Provide RTP ramp rate data and wafer temperature uniformity specifications

• Distinguish cooling function from RTP lamp heating to stay in 8419