RTP Rapid Thermal Processor Chiller from Japan
High-capacity chiller for rapid thermal processing (RTP) systems, enabling millisecond temperature ramps up to 1200°C followed by controlled cooling for wafer annealing. 8419.89.9540 for semiconductor thermal treatment cooling equipment. Critical for dopant activation.
Duty Rate — Japan → United States
12.5%
Rate breakdown
9903.05.4912.5%Except for products described in headings 9903.05.85–9903.05.92, articles the product of Japan, with an ad valorem (or ad valorem equivalent) rate of duty under column 1 less than 12.5 percent, as provided for in U.S. note 52 to this subchapter
Import Tips
• Provide RTP ramp rate data and wafer temperature uniformity specifications
• Distinguish cooling function from RTP lamp heating to stay in 8419