RTP Rapid Thermal Processor Chiller from China
High-capacity chiller for rapid thermal processing (RTP) systems, enabling millisecond temperature ramps up to 1200°C followed by controlled cooling for wafer annealing. 8419.89.9540 for semiconductor thermal treatment cooling equipment. Critical for dopant activation.
Duty Rate — China → United States
39.2%
Rate breakdown
9903.03.0110%Except for products described in headings 9903.03.02–9903.03.11, articles the product of any country, as provided for in subdivision (aa) of U.S. note 2 to this subchapter
9903.88.0225%Except as provided in headings 9903.88.12, 9903.88.17, 9903.88.20, 9903.88.54, 9903.88.59, 9903.88.61, 9903.88.63, 9903.88.66, 9903.88.67, 9903.88.68, 9903.88.69, or 9903.88.70, articles the product of China, as provided for in U.S. note 20(c) to this subchapter and as provided for in the subheadings enumerated in U.S. note 20(d)
Import Tips
• Provide RTP ramp rate data and wafer temperature uniformity specifications
• Distinguish cooling function from RTP lamp heating to stay in 8419