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8419.89.95.40/CVD Deposition Chamber Heat Exchanger/Mexico

CVD Deposition Chamber Heat Exchanger from Mexico

Plate heat exchanger for chemical vapor deposition chambers, cooling precursor gases and reactor walls during thin film deposition on semiconductor wafers. 8419.89.9540 for temperature change treatment in semiconductor manufacturing.

Duty Rate — Mexico → United States

14.2%

Rate breakdown

9903.05.5510%Section 301 (forced labor) — additional 10% ad valorem on products of Mexico
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Import Tips

• Specify precursor gas thermal profiles and deposition uniformity data

• Classify as cooling exchanger, not reactor part

CVD Deposition Chamber Heat Exchanger from Mexico — Import Duty Rate | HTS 8419.89.95.40