RTP Furnace Lamp Reflector Assembly from China
High-reflectivity reflector assembly for directing thermal radiation in Rapid Thermal Processing (RTP) furnaces for semiconductor annealing. HTS 8417.90.00.00 as parts of nonelectric industrial ovens using radiative heating for wafer processing. Gold or specialized coatings maximize thermal efficiency.
Duty Rate — China → United States
38.9%
Rate breakdown
9903.03.0110%Except for products described in headings 9903.03.02–9903.03.11, articles the product of any country, as provided for in subdivision (aa) of U.S. note 2 to this subchapter
9903.88.0125%Except as provided in headings 9903.88.05, 9903.88.06, 9903.88.07, 9903.88.08, 9903.88.10, 9903.88.11, 9903.88.14, 9903.88.19, 9903.88.50, 9903.88.52, 9903.88.58, 9903.88.60, 9903.88.62, 9903.88.66, 9903.88.67, 9903.88.68, or 9903.88.69, articles the product of China, as provided for in U.S. note 20(a) to this subchapter and as provided for in the subheadings enumerated in U.S. note 20(b) [to this subchapter]
Import Tips
• Specify reflectivity coefficients (>95% at target wavelengths); document RTP process temperatures (>1000°C in seconds); distinguish from lighting reflectors