Rapid Thermal Processing RTP Furnace from Canada
Nonelectric semiconductor furnace using lamp arrays for ultra-fast wafer heating to 1200°C in seconds for annealing and silicide formation. Critical for submicron semiconductor device fabrication preventing dopant redistribution. HTS 8417.80.00.00 for industrial nonelectric processing furnaces.
Duty Rate — Canada → United States
13.9%
Rate breakdown
9903.05.2910%Section 301 (forced labor) — additional 10% ad valorem on products of Canada
Import Tips
• Specify lamp heating as nonelectric radiant process; provide ramp rate specifications proving semiconductor application
• Ensure cleanroom compatibility certification for preferential treatment