Hitachi High-Tech DC Etch System Condensing Unit

Condensing unit exceeding 17.58 kW/hr for Hitachi High-Tech's deep reactive ion etch systems processing semiconductor wafers. Manages heat from plasma generation for precise temperature control. HTS 8415.83.0060 classification for high-capacity cleanroom AC condensing units.

Import Duty Rates by Country of Origin

Origin CountryMFN RateCh.99 SurchargesTotal Effective Rate
🇨🇳China1.4%+35.0%36.4%
🇲🇽Mexico1.4%+10.0%11.4%
🇨🇦Canada1.4%+10.0%11.4%
🇩🇪Germany1.4%+10.0%11.4%
🇯🇵Japan1.4%+10.0%11.4%

Alternative Classifications

This product could be classified differently depending on its characteristics or intended use.

8456.30Lower: 12.4% vs 36.4%

If for etching metal in semiconductor fabrication

Machine tools for semiconductor material working have specific provisions.

8415.82.01Higher: 37.2% vs 36.4%

If incorporating refrigerating components

Self-contained refrigeration shifts classification.

8504.40.85.00Lower: 35% vs 36.4%

If power converter integrated units

Units with significant electrical conversion functions may classify under converters.

Not sure which classification is right?

Our AI classifier can analyze your specific product and recommend the correct HTS code with confidence.

Import Tips & Compliance

Include plasma process thermal load calculations justifying high-capacity rating

Ensure proper hazardous location certifications for etch chamber proximity

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