Hitachi High-Tech DC Etch System Condensing Unit from China
Condensing unit exceeding 17.58 kW/hr for Hitachi High-Tech's deep reactive ion etch systems processing semiconductor wafers. Manages heat from plasma generation for precise temperature control. HTS 8415.83.0060 classification for high-capacity cleanroom AC condensing units.
Duty Rate — China → United States
51.4%
Rate breakdown
9903.82.0925%Except as provided for in headings 9903.82.16, 9903.82.20–9903.82.26 and 9903.85.68, articles of copper and derivative aluminum and steel articles, as provided for in subdivisions (c)(vi)–(viii) and (xi) of U.S. note 16 to this subchapter
9903.88.0325%Except as provided in headings 9903.88.13, 9903.88.18, 9903.88.33, 9903.88.34, 9903.88.35, 9903.88.36, 9903.88.37, 9903.88.38, 9903.88.40, 9903.88.41, 9903.88.43, 9903.88.45, 9903.88.46, 9903.88.48, 9903.88.56, 9903.88.64, 9903.88.66, 9903.88.67, 9903.88.68, or 9903.88.69, articles the product of China, as provided for in U.S. note 20(e) to this subchapter and as provided for in the subheadings enumerated in U.S. note 20(f)
9903.05.900%Articles already subject to Section 232 (steel/aluminum/copper + derivatives, autos + parts, wood, medium/heavy vehicles + parts, semiconductors, patented pharma) — U.S. note 52(f)
Import Tips
• Include plasma process thermal load calculations justifying high-capacity rating
• Ensure proper hazardous location certifications for etch chamber proximity