Hitachi High-Tech DC Etch System Condensing Unit from Mexico
Condensing unit exceeding 17.58 kW/hr for Hitachi High-Tech's deep reactive ion etch systems processing semiconductor wafers. Manages heat from plasma generation for precise temperature control. HTS 8415.83.0060 classification for high-capacity cleanroom AC condensing units.
Duty Rate — Mexico → United States
11.4%
Rate breakdown
9903.03.0110%Except for products described in headings 9903.03.02–9903.03.11, articles the product of any country, as provided for in subdivision (aa) of U.S. note 2 to this subchapter
Import Tips
• Include plasma process thermal load calculations justifying high-capacity rating
• Ensure proper hazardous location certifications for etch chamber proximity