Hitachi High-Tech DC Etch System Condensing Unit from Mexico
Condensing unit exceeding 17.58 kW/hr for Hitachi High-Tech's deep reactive ion etch systems processing semiconductor wafers. Manages heat from plasma generation for precise temperature control. HTS 8415.83.0060 classification for high-capacity cleanroom AC condensing units.
Duty Rate — Mexico → United States
26.4%
Rate breakdown
9903.82.0925%Except as provided for in headings 9903.82.16 and 9903.85.68, articles of copper and derivative aluminum and steel articles, as provided for in subdivisions (c)(vi)–(viii) of U.S. note 16 to this subchapter
9903.03.060%Articles of aluminum, of steel, or of copper or derivative aluminum or steel articles; passenger vehicles (sedans, sport utility vehicles, crossover utility vehicles, minivans, and cargo vans) and light trucks; parts of passenger vehicles (sedans, sport utility vehicles, crossover utility vehicles, minivans, and cargo vans) and light trucks; medium- and heavy-duty vehicles; parts of medium- and heavy-duty vehicles; wood products; and semiconductor articles, of any country, as provided in subdivision (aa)(v) of U.S. note 2 to this subchapter
Import Tips
• Include plasma process thermal load calculations justifying high-capacity rating
• Ensure proper hazardous location certifications for etch chamber proximity