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Tantalum Sputtering Target Crucible

A tantalum cup crucible holding sputtering material for PVD thin-film deposition in microelectronics. Classified in HTS 8103.91.00.00 for its crucible form and tantalum material used in vacuum heating.

Import Duty Rates by Country of Origin

Origin CountryMFN RateCh.99 SurchargesTotal Effective Rate
🇨🇳China4.4%4.4%
🇲🇽Mexico4.4%4.4%
🇨🇦Canada4.4%4.4%
🇩🇪Germany4.4%4.4%
🇯🇵Japan4.4%4.4%

Alternative Classifications

This product could be classified differently depending on its characteristics or intended use.

8103.20.00Higher: 27.5% vs 4.4%

If in unwrought bar or rod form, not shaped

Unwrought tantalum bars for further fabrication under separate subheading.

8479.89Higher: 12.5% vs 4.4%

If part of complete sputtering deposition machines

Machinery for physical vapor deposition integrates crucibles under Chapter 84.

2846.90.80Lower: 3.7% vs 4.4%

If pre-filled with rare-earth compounds for sputtering

Chemical compounds in crucibles may predominate under Chapter 28.

Not sure which classification is right?

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Import Tips & Compliance

Cleanroom packaging required; contamination voids purity claims during inspection

Distinguish from flat targets—crucible shape determines 8103.91 classification

EPA declarations if coated with hazardous source materials pre-import

Related Products under HTS 8103.91.00.00

Tantalum Evaporation Crucible

A high-purity tantalum crucible designed for thermal evaporation processes in semiconductor and thin-film coating applications. It falls under HTS 8103.91.00.00 as a crucible made primarily of tantalum, used to contain and heat materials to extreme temperatures without contamination.

Tantalum Melting Crucible

A cylindrical tantalum crucible used in vacuum arc melting furnaces for producing high-purity metals and alloys in aerospace applications. Classified under HTS 8103.91.00.00 due to its tantalum construction and function as a vessel for melting at elevated temperatures.

Tantalum Crystal Growth Crucible

A boat-shaped tantalum crucible for Czochralski crystal growth processes in optics and electronics production. Under HTS 8103.91.00.00 for its tantalum composition and role in containing molten material during crystal pulling.

Tantalum Powder Metallurgy Crucible

Tantalum crucible for hot isostatic pressing (HIP) of powder metal parts in medical implants. HTS 8103.91.00.00 applies to this tantalum container for high-pressure, high-temperature sintering.

Tantalum Flux Crucible

Tantalum crucible resistant to fluoride fluxes in rare-earth element extraction processes. HTS 8103.91.00.00 covers this chemical-resistant tantalum vessel used in flux melting.

Tantalum Lab Analysis Crucible

A small, precision tantalum crucible for gravimetric analysis in chemical laboratories, resistant to acids and high heat. It qualifies for HTS 8103.91.00.00 as a tantalum article specifically shaped and used as a crucible for sample preparation.