Tantalum Sputtering Target Crucible from Japan
A tantalum cup crucible holding sputtering material for PVD thin-film deposition in microelectronics. Classified in HTS 8103.91.00.00 for its crucible form and tantalum material used in vacuum heating.
Duty Rate — Japan → United States
4.4%
Rate breakdown
9903.03.030%Articles the product of any country, as provided for in subdivision (aa)(ii) of U.S. note 2 to this subchapter
Import Tips
• Cleanroom packaging required; contamination voids purity claims during inspection
• Distinguish from flat targets—crucible shape determines 8103.91 classification
• EPA declarations if coated with hazardous source materials pre-import