Tantalum Evaporation Crucible
A high-purity tantalum crucible designed for thermal evaporation processes in semiconductor and thin-film coating applications. It falls under HTS 8103.91.00.00 as a crucible made primarily of tantalum, used to contain and heat materials to extreme temperatures without contamination.
Import Duty Rates by Country of Origin
Alternative Classifications
This product could be classified differently depending on its characteristics or intended use.
If supplied as part of semiconductor manufacturing equipment
Machines and apparatus for semiconductor fabrication may encompass integrated crucibles, shifting to Chapter 84.
If pre-loaded with prepared chemical compounds for lab use
Prepared binders or chemical products for foundry use including crucibles fall under Chapter 38.
If coated with refractory ceramics for high-temperature protection
Refractory crucibles of graphite or ceramics with significant non-tantalum composition change to Chapter 69.
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Import Tips & Compliance
• Verify tantalum purity exceeds 99% by weight to confirm classification under Chapter 81; provide mill test certificates
• Include end-use documentation for high-tech applications to avoid reclassification as general waste or scrap
• Watch for anti-dumping duties on tantalum products from certain origins; check current Commerce Department notices
Related Products under HTS 8103.91.00.00
Tantalum Melting Crucible
A cylindrical tantalum crucible used in vacuum arc melting furnaces for producing high-purity metals and alloys in aerospace applications. Classified under HTS 8103.91.00.00 due to its tantalum construction and function as a vessel for melting at elevated temperatures.
Tantalum Crystal Growth Crucible
A boat-shaped tantalum crucible for Czochralski crystal growth processes in optics and electronics production. Under HTS 8103.91.00.00 for its tantalum composition and role in containing molten material during crystal pulling.
Tantalum Sputtering Target Crucible
A tantalum cup crucible holding sputtering material for PVD thin-film deposition in microelectronics. Classified in HTS 8103.91.00.00 for its crucible form and tantalum material used in vacuum heating.
Tantalum Powder Metallurgy Crucible
Tantalum crucible for hot isostatic pressing (HIP) of powder metal parts in medical implants. HTS 8103.91.00.00 applies to this tantalum container for high-pressure, high-temperature sintering.
Tantalum Flux Crucible
Tantalum crucible resistant to fluoride fluxes in rare-earth element extraction processes. HTS 8103.91.00.00 covers this chemical-resistant tantalum vessel used in flux melting.
Tantalum Lab Analysis Crucible
A small, precision tantalum crucible for gravimetric analysis in chemical laboratories, resistant to acids and high heat. It qualifies for HTS 8103.91.00.00 as a tantalum article specifically shaped and used as a crucible for sample preparation.