Cold-Formed Nickel Foil for Vacuum Deposition Targets
High-purity cold-formed nickel foil used as sputtering targets for thin-film vacuum deposition. HTS 7506.10.10.00 applies to non-alloyed foil cold-rolled for uniform evaporation. Key for semiconductor and optical coatings.
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Alternative Classifications
This product could be classified differently depending on its characteristics or intended use.
If prepared sputtering target assemblies
Fabricated deposition materials classify chemically.
If machined into finished target shapes
Specific articles of nickel beyond sheet/foil.
If in powder form for targets
Nickel powders for deposition use Chapter 28.
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Import Tips & Compliance
• Require 5N purity certificates (99.999% Ni) for semiconductor qualification
• Use hermetic packaging documentation to prove vacuum-ready condition
• EAR classification (ECCN 3A991) needed for high-tech deposition materials
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