Cold-Formed Nickel Foil for Vacuum Deposition Targets from China
High-purity cold-formed nickel foil used as sputtering targets for thin-film vacuum deposition. HTS 7506.10.10.00 applies to non-alloyed foil cold-rolled for uniform evaporation. Key for semiconductor and optical coatings.
Duty Rate — China → United States
38%
Rate breakdown
9903.03.0110%Except for products described in headings 9903.03.02–9903.03.11, articles the product of any country, as provided for in subdivision (aa) of U.S. note 2 to this subchapter
9903.88.0325%Except as provided in headings 9903.88.13, 9903.88.18, 9903.88.33, 9903.88.34, 9903.88.35, 9903.88.36, 9903.88.37, 9903.88.38, 9903.88.40, 9903.88.41, 9903.88.43, 9903.88.45, 9903.88.46, 9903.88.48, 9903.88.56, 9903.88.64, 9903.88.66, 9903.88.67, 9903.88.68, or 9903.88.69, articles the product of China, as provided for in U.S. note 20(e) to this subchapter and as provided for in the subheadings enumerated in U.S. note 20(f)
Import Tips
• Require 5N purity certificates (99.999% Ni) for semiconductor qualification
• Use hermetic packaging documentation to prove vacuum-ready condition
• EAR classification (ECCN 3A991) needed for high-tech deposition materials