Cold-Formed Nickel Foil for Vacuum Deposition Targets from Japan
High-purity cold-formed nickel foil used as sputtering targets for thin-film vacuum deposition. HTS 7506.10.10.00 applies to non-alloyed foil cold-rolled for uniform evaporation. Key for semiconductor and optical coatings.
Duty Rate — Japan → United States
12.5%
Rate breakdown
9903.05.4912.5%Except for products described in headings 9903.05.85–9903.05.92, articles the product of Japan, with an ad valorem (or ad valorem equivalent) rate of duty under column 1 less than 12.5 percent, as provided for in U.S. note 52 to this subchapter
Import Tips
• Require 5N purity certificates (99.999% Ni) for semiconductor qualification
• Use hermetic packaging documentation to prove vacuum-ready condition
• EAR classification (ECCN 3A991) needed for high-tech deposition materials