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HFC-23 Semiconductor Etch Gas

Ultra-high purity trifluoromethane (HFC-23) used in plasma etching processes for semiconductor manufacturing, particularly for tungsten and oxide etch applications. Classified in HTS 2903.41.10.00 as a separate chemically defined fluorinated hydrocarbon meeting Chapter 29 heading requirements.

Import Duty Rates by Country of Origin

Origin CountryMFN RateCh.99 SurchargesTotal Effective Rate
🇨🇳China3.7%+12.5%16.2%
🇲🇽Mexico3.7%+10.0%13.7%
🇨🇦Canada3.7%+10.0%13.7%
🇩🇪GermanyFree+10.0%10%
🇯🇵JapanFree+12.5%12.5%

Alternative Classifications

This product could be classified differently depending on its characteristics or intended use.

2811.29.50.00Higher: 41.2% vs 16.2%

If marketed primarily as non-organic gas for industrial processes

Gases not qualifying as organic compounds could shift to Chapter 28 inorganic chemicals.

3824.99Higher: 17.5% vs 16.2%

If specialty gas mixtures for semiconductor processes

Mixtures with carrier gases or etchants classify as prepared chemical mixtures under 3824.

Not sure which classification is right?

The Tariff Assistant works through the GRI rules on your specific product to reach the right HTS code — and can price the duty on it in the same conversation.

Import Tips & Compliance

• Require SEMI-standard purity certificates (99.999%+) and confirm no moisture/particulates per semiconductor gas specs

• DOT UN1048 labeling required; ensure compatibility with stainless steel or aluminum cylinders

• Avoid industrial-use misclassification to 3824; pure HFC-23 remains Chapter 29 regardless of end-use

Related Products under HTS 2903.41.10.00