Boron Carbide Sputtering Target Material from Germany
High-density boron carbide material prepared for thin-film deposition via sputtering in semiconductor manufacturing. Classified under HTS 2849.90.10.00 as chemically defined boron carbide in raw target form.
Duty Rate — Germany → United States
10%
Rate breakdown
9903.05.3910%Except for products described in headings 9903.05.85–9903.05.92 and 9903.05.97, articles the product of a member state of the European Union, with an ad valorem (or ad valorem equivalent) rate of duty under column 1 less than 10 percent, as provided for in U.S. note 52 to this subchapter
Import Tips
• Provide sputtering target density (>95% theoretical) and surface finish specifications
• Classify as chemical compound, not finished article, if not mounted on backing plates
• Cleanroom packaging required; contamination voids chemical purity claims